| 摘要 |
A measuring apparatus and an exposure apparatus having the same are provided to measure more accurately distribution of an original light source by correcting cloudy of light passing through a pinhole according to geometric optics or wave optics. In a measuring apparatus, an illumination optics device(1) illuminates a reticle(2) by using light from a light source. A reticle stage includes the reticle to be driven. A projection optical device projects the reticle on a light emitted body. A relay optical device guids light passing through the illumination optics device. A housing having the relay optical device is mounted on the reticle stage instead of the reticle.
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