| 摘要 |
A mask for forming an organic electroluminescence layer is provided to decrease a shadow phenomenon by forming a deposition layer without deviation from a designated location of a substrate. In a mask(M1) for forming electroluminescence layer, an angle of inclination of both side-walls and both rear and front walls of a pattern formed in a center is equal. As deposition sources(S1,S2) is close to the pattern, the angle of inclination of the side wall closest to the deposition sources(S1,S2) among the both side walls increase gradually. As the deposition sources(S1,S2) is far from the pattern, the angle of inclination of the side wall farthest from the deposition sources(S1,S2) decreases gradually. As the deposition sources(S1,S2) is adjacent to the pattern, the angle of inclination of the front side wall increases gradually. As the deposition sources(S1,S2) is far from the pattern, the angle of inclination decrease gradually. As the deposition sources(S1,S2) is close to the pattern, the angle of inclination of the rear side wall decrease gradually. As the deposition sources(S1,S2) is far from the pattern, the angle of inclination of the rear side wall increase gradually. All patterns are arranged to be symmetrical one another on the center of a pattern line including a central pattern. |
