发明名称 |
Defect inspection apparatus, defect inspection method and method of inspecting hole pattern |
摘要 |
A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.
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申请公布号 |
US2006232769(A1) |
申请公布日期 |
2006.10.19 |
申请号 |
US20050243425 |
申请日期 |
2005.10.05 |
申请人 |
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发明人 |
SUGIHARA MARI;OOMORI TAKEO;FUKAZAWA KAZUHIKO |
分类号 |
G01N21/88 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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