Dielectric-layer-coated substrate and installation for production thereof

摘要

The invention relates to a substrate ( 1 ), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam ( 3 ) coming from an ion source ( 4 ), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.