FLUORIDE LIQUID CLEANERS WITH POLAR AND NON-POLAR SOLVENT MIXTURES FOR CLEANING LOW-K-CONTAINING MICROELECTRONIC DEVICES

摘要

A liquid removal composition and process for removing post-ash residue, post-etch residue and/or bottom anti-reflective coating (BARC) residue from a microelectronic device having said residue thereon. The liquid removal composition includes a fluoride source and an amphiphilic solvent. The composition achieves high-efficiency removal of the residue material from the microelectronic device without damaging metal species or low-k dielectric materials employed in the microelectronic device architecture.