PATTERN INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a defect inspection method with high sensitivity while suppressing influences by fluctuation in an optical system.

SOLUTION: The defect detection method in a pattern such as an exposure mask includes: a variation similarity calculating step of calculating similarity in variation between an optical image in other pixels than inspection target pixels and a reference image based on the variation between an optical image in the inspection target pixels and the reference image; a priority determining step of calculating the priority as comparing members based on the variation similarity; and a mutual comparing step of mutually comparing patterns in an identical design present in the optical image to detect a defect.

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