| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus for suppressing arc discharge by preventing the plasma entrance into the gas hole of a showerhead even in case of applying a first high frequency electric power, by generating a sheath firstly with a second high frequency electric power, by adding the second high frequency electric power of 300 W to 1,000 W lower than the first frequency electric power, then adding the first frequency electric power to an upper electrode, with a time delay for 1 to 3 seconds. <P>SOLUTION: The plasma processing apparatus 10 is provided with an upper electrode 13 and a lower electrode 14 facing oppositely in a processing chamber 12. The second high frequency electric power is applied first to the upper electrode 13, and then with a time delay for 1 to 3 seconds after that, the first high frequency electric power is superimposed and applied. <P>COPYRIGHT: (C)2007,JPO&INPIT |
