| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having high exposure sensitivity, small surface tackiness, good laminating property, good handleability and excellent storage stability and exhibiting excellent plating resistance, chemical resistance, surface hardness and heat resistance after development, and to provide a photosensitive film using the composition, a high-definition permanent pattern and a method for efficiently forming the pattern. <P>SOLUTION: The photosensitive composition contains at least (A) an alkali-soluble resin, (B) a polymerizable compound, (C) a photopolymerization initiator, (D) a thermal crosslinking agent and (E) at least one compound having two or more substituents capable of chain transfer. The photosensitive film using the composition, the permanent pattern and the method for forming the pattern are also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
