| 摘要 |
PROBLEM TO BE SOLVED: To provide plasma CVD equipment that can perform effective and clean reactor cleaning, and check whether the reactor cleaning has been completed without fail. SOLUTION: A semiconductor processor capable of self-cleaning is provided, which is equipped with an optical device for irradiating a monochromatic beam inside a reactor through an optical window provided on an inner wall of the reactor, and receive the reflected beam to detect how substances adhering to the inner surface are removed. By precisely detecting completion of the cleaning, the cleaning sequence is promptly terminated, thus improving the productivity. COPYRIGHT: (C)2007,JPO&INPIT
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