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发明名称
Method and device for forming vapor deposition film by surface liquid plasma
摘要
申请公布号
AU2006234466(A1)
申请公布日期
2006.10.19
申请号
AU20060234466
申请日期
2006.04.03
申请人
TOYO SEIKAN KAISHA, LTD.
发明人
KOUJI YAMADA;HIDEO KURASHIMA;HAJIME INAGAKI;ICHIRO KUNIHIRO
分类号
C23C16/511
主分类号
C23C16/511
代理机构
代理人
主权项
地址
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