发明名称 CONTROL METHOD OF PLASMA TREATMENT APPARATUS
摘要 A frequency control circuit (45) controls oscillation frequency of a second high-frequency power source according to a phase difference between the voltage component and the current component measured by a phase difference sensor (41) and an input impedance to an impedance matching device (34) measured by an impedance sensor (42). An amplitude control circuit (44) controls the high- frequency power output by the second high-frequency power source (51) according to the power (effective power) supplied to the impedance matching device (34) side and measured by a power sensor (40).
申请公布号 KR20060107591(A) 申请公布日期 2006.10.13
申请号 KR20067018877 申请日期 2006.09.14
申请人 TOKYO ELECTRON LIMITED 发明人 HIGASHIURA TSUTOMU
分类号 H01L21/205;H05H1/46;C23C16/509;H01J37/32;H01L21/31 主分类号 H01L21/205
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