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经营范围
发明名称
Composition Calculation Method for Multi Component Thin Film by Atomic Layer Deposition
摘要
申请公布号
KR100633333(B1)
申请公布日期
2006.10.12
申请号
KR20050014976
申请日期
2005.02.23
申请人
发明人
分类号
H01L21/20;H01L21/66
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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