发明名称 SEMICONDUCTOR PARTICULATE PASTE AND ITS MANUFACTURING METHOD AS WELL AS PHOTOELECTRIC CONVERSION ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor particulate paste with semiconductor particulate of a specific size dispersed in it, especially one with high dispersion, and its manufacturing method. <P>SOLUTION: The manufacturing method of the semiconductor particulate paste is used for forming a semiconductor layer of a photoelectric conversion element, and includes a process (a) of dispersing semiconductor particulate in a solvent, a process (b) of centrifuging semiconductor particulate slurry obtained in the process (a) and extracting semiconductor particulate slurry containing semiconductor particulate of a specific size, and a process (c) of forming the semiconductor particulate paste from the semiconductor particulate slurry obtained in the process (b). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006278023(A) 申请公布日期 2006.10.12
申请号 JP20050092236 申请日期 2005.03.28
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 SEKIGUCHI TAKASHI
分类号 H01M14/00;H01L31/04 主分类号 H01M14/00
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