发明名称 METHOD FOR MANUFACTURING PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK
摘要 <P>PROBLEM TO BE SOLVED: To achieve resistance to the high-temperature water of 80&deg;C concerning an optical semi-transmission film which is optically designed using nitrogen, metal, and silicon as main components. <P>SOLUTION: In a phase shift mask blank, an optical semi-transmission film which has a predetermined transmission to an exposure wavelength, and is optically designed using nitrogen, metal, and silicon as main components is formed on a transparent substrate. The phase shift mask blank contains oxygen in the optical semi-transmission film composed mainly of nitrogen, metal, and silicon within the range of maintaining the optical characteristics of the optical design using nitrogen, metal, and silicon as main components, and has achieved an improved resistance to high-temperature water of the optical semi-transmission film composed mainly of nitrogen, metal and silicon. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006276648(A) 申请公布日期 2006.10.12
申请号 JP20050097852 申请日期 2005.03.30
申请人 HOYA CORP 发明人 TAKEUCHI MEGUMI;SUZUKI TOSHIYUKI;USHIDA MASAO
分类号 G03F1/32;G03F1/54;G03F1/68;H01L21/027 主分类号 G03F1/32
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