| 摘要 |
PROBLEM TO BE SOLVED: To simply conduct positioning of a lower vessel and an upper vessel without dependence on the gut feeling of a worker and improve efficiency in the assembling work of the lower and upper vessels through improvement in the positioning accuracy. SOLUTION: The apparatus for manufacturing semiconductor device comprises an upper vessel 7 formed of a dielectric material with inclusion of a flange 41 at the circumference thereof, a lower vessel 6 formed of a metal for defining the upper vessel and a substrate processing chamber when the upper vessel is provided, a flange holding 42 for fixing the flange to the lower vessel by clamping the same from the upper side, a positioning unit for positioning the upper vessel by placing the upper vessel in contact with the side surface of flange, a substrate setting board 10 provided at the lower vessel to place the substrate 3, plasma generating means 22, 26 provided in the periphery of the upper vessel, a gas supplying pipe 13 for introducing the processing gas to the substrate processing chamber, and a gas exhaust pipe 17 for exhausting the gas from the substrate processing chamber. COPYRIGHT: (C)2007,JPO&INPIT
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