发明名称 FORMING METHOD OF ALIGNMENT LAYER, ALIGNMENT LAYER, SUBSTRATE FOR ELECTRON DEVICE, LIQUID CRYSTAL PANEL, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a forming method of an alignment layer capable of manufacturing the alignment layer having excellent light resistance and excellent alignment characteristics (a function regulating an alignment state of a liquid crystal material), to provide the alignment layer obtained by the forming method and to provide a substrate for an electron device provided with the alignment layer, a liquid crystal panel, and electronic equipment. SOLUTION: The forming method of the alignment layer for forming the alignment layer on a base material has a step for forming a film constituted of a liquid for forming the alignment layer on the base material using the liquid for forming the alignment layer containing a hydrolyzate of a silane compound having an organic group and a hydrolyzate of tetraalkoxysilane and a heating step for heating the film. In the silane compound, a carbon atom which constitutes the organic group is directly bonded to a silicon atom. The organic group is a functional group containing an aromatic ring. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006276502(A) 申请公布日期 2006.10.12
申请号 JP20050096286 申请日期 2005.03.29
申请人 SEIKO EPSON CORP 发明人 KUROSAWA RYUICHI
分类号 G02F1/1337 主分类号 G02F1/1337
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