发明名称
摘要 <p>A method for forming a pattern includes forming a resist pattern on a printing roll, printing a multi-stepped resist pattern on an etching object layer formed on a substrate by using the printing roll and etching the etching object layer by using the printed resist pattern as a mask.</p>
申请公布号 JP3830916(B2) 申请公布日期 2006.10.11
申请号 JP20030144292 申请日期 2003.05.22
申请人 发明人
分类号 G02F1/13;G02F1/1368;G03F7/00;H01L21/00;H01L21/28;H01L21/3213;H01L21/336;H01L21/768;H01L21/77;H01L21/84;H01L27/12;H01L29/786 主分类号 G02F1/13
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