| 摘要 |
<p>The invention relates to a dual stage lithographic apparatus, wherein to substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement (71) for bringing the lithographic apparatus from a first situation, wherein immersion liquid (66) is confined between a first substrate (14) held by the first stage (42.1) of the said stages and a final element (70) of a projection system (18) of the apparatus, towards a second situation, wherein the said liquid is confined between a second substrate (14) held by the second stage (42.2) of the two stages and the final element, such that during the joint scan movement the liquid is essentially confined within said space with respect to the final element.</p> |
