发明名称 |
DEVELOPMENT DEVICE AND DEVELOPMENT METHOD |
摘要 |
A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.
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申请公布号 |
EP1708252(A1) |
申请公布日期 |
2006.10.04 |
申请号 |
EP20040807773 |
申请日期 |
2004.12.24 |
申请人 |
TOKYO ELECTRON LTD. |
发明人 |
OOKOUCHI, ATSUSHI;YAMAMOTO, TARO;TAKEGUCHI, HIROFUMI;KYOUDA, HIDEHARU;YOSHIHARA, KOUSUKE |
分类号 |
G03F7/30;H01L21/00;H01L21/027 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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