PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART

摘要

A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I):
wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II):
wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R 1 and R 2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.