发明名称 Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method
摘要 The invention relates to an illumination assembly, including a beam expander being arranged for receiving from a radiation source a radiation beam directed in a first direction (z) and for expanding the beam with a first magnification factor in a second direction (x) and with a second magnification factor in a third direction (y). The first, second and third directions being substantially mutually orthogonal. The illumination assembly further includes a beam splitter that is arranged for splitting the radiation beam in two split radiation beams split in at least one of the second and third direction, the propagation direction of the split radiation beams being substantially in the first direction. The beam splitter is further arranged for delivering the split radiation beams to the beam expander, of which at least one of the magnification factors is adjustable.
申请公布号 US7116400(B2) 申请公布日期 2006.10.03
申请号 US20040858409 申请日期 2004.06.02
申请人 ASML NETHERLANDS B.V. 发明人 BOTMA HAKO
分类号 G02B5/00;G03B27/42;G02B27/10;G03B27/54;G03F7/20;H01L21/027 主分类号 G02B5/00
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