发明名称 A sensor for use in a lithographic apparatus
摘要 A sensor for use at substrate level in a high-NA lithographic apparatus has a transparent plate covering a sensing element and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
申请公布号 SG125238(A1) 申请公布日期 2006.09.29
申请号 SG20060001220 申请日期 2006.02.24
申请人 ASML NETHERLANDS B.V. 发明人 KOK HAICO VICTOR;KERKHOF VAN DE MARCUS ADRIANUS;KRUIZINGA BORGERT;SENGERS TIMOTHEUS FRANCISCUS;MOEST BEARRACH;HAAST MARC ANTONIUS MARIA;WEISSBRODT PETER WERNER;SCHRENK MANFRED HELMUT GUSTAV WILHELM JOHANNES;HARZENDORF TORSTEN
分类号 主分类号
代理机构 代理人
主权项
地址