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发明名称
Vorrichtung zur schnellen Plasmawärmebehandlung mit verbessertem Zufuhrstutzen der Radikalquelle
摘要
申请公布号
DE112004001735(T5)
申请公布日期
2006.09.28
申请号
DE200411001735
申请日期
2004.09.17
申请人
KORNIC SYSTEMS CORP.
发明人
SI, SUNG SOO;KIM, SEONG TAE;LEE, SEOK JEONG;YEON, KANG HEUM;SONG, DAE SEOK
分类号
H01L21/324;H01J37/32
主分类号
H01L21/324
代理机构
代理人
主权项
地址
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