| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multilayer film reflecting mirror and exposure apparatus which can reduce the stress of the multilayer film without reducing the number of layers of materials in the multilayer film. <P>SOLUTION: The multilayer film 11 reflecting light (EUV light) in soft X-ray region is formed on the surface of a substrate 12. The multilayer film of the first layer 21 and the second layer 22 with different refractivities in the soft X-ray region is stacked by turns. The first material constituting at least either one of the first layer and the second layer (for example, first layer 21) is separated into a plurality of thin layers 2A by the second material different from the first material and the film thickness D<SB>MB</SB>of the thin layer 2B of the second material is 0.7 nm or less. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
