| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material excellent in adhesion resistance during storage of the heat developable photosensitive material and having improved photographic properties. SOLUTION: The heat developable photosensitive material is obtained by disposing an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder on at least one surface of a support, wherein the heat developable photosensitive material contains a polymer latex having a core-shell structure in an outermost layer on the at least one surface side of the support, wherein the shell portion of the core-shell structure contains a monomer (M2) having a fluorine atom and a radical polymerizable unsaturated bond. COPYRIGHT: (C)2006,JPO&NCIPI
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