| 摘要 |
PROBLEM TO BE SOLVED: To provide a compact atmospheric plasma discharge treatment device with a simple structure capable of uniformly feeding gas and capable of depositing a thin film of high quality. SOLUTION: The plasma discharge treatment device comprises: a pair of confronted ring-shaped electrodes; a moving means of allowing a cylindrical or columnar base material at least to pass through the inside of the rings of the electrodes; power sources connected to the electrodes and generating high frequency voltage; and a gas feeding means of feeding a gaseous mixture of a thin film material gas and a discharge gas for depositing a thin film on the confronted region in the electrodes. COPYRIGHT: (C)2006,JPO&NCIPI
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