发明名称 INSTRUMENT AND METHOD FOR OPTICAL CHARACTERISTIC MEASUREMENT, EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To enable to highly accurately measure an optical characteristic by manufacturing an inexpensive sensor having high resolution. <P>SOLUTION: The optical characteristic measurement instrument has a pixel in which detectors 95 for outputting a detection signal including information about the optical characteristic of a projection optical system PL are arranged in a Z-axis direction, and the linear sensor 95a successively outputs a detection signal including information about the optical characteristic of the projection optical system PL while moving in an X-axis direction via linear motors LM1, LM2. Thus, although a linear sensor is used more easily manufactured than an area sensor having pixels arranged in an XZ surface, detection signals in the entire XZ surface can be output, and the instrument has the function similar to that of the area sensor having pixels arranged in the XZ surface. In this case, since a sensor having high resolution can be inexpensively manufactured, the measurement of highly accurate optical characteristic (wavefront aberration etc. ) can be performed, and the entire instrument can be inexpensively manufactured. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006261151(A) 申请公布日期 2006.09.28
申请号 JP20050072254 申请日期 2005.03.15
申请人 NIKON CORP 发明人 TAKAHASHI AKIRA;HAMASHIMA YOICHI
分类号 H01L21/027;G01M11/02;G03F7/20 主分类号 H01L21/027
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