HIGH INTEGRITY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING BULK QUANTITIES OF SAME

摘要

A method of making a sputtering target, comprising: providing a slab comprising at least one metal; a first rolling of said slab to form an intermediate plate, wherein said first rolling includes a plurality of rolling passes; and a second rolling to form a metal plate, wherein said second rolling includes a plurality of rolling passes, and wherein each of said rolling passes of said second rolling imparts a true strain reduction of about 0. 2 or more.