发明名称 |
PRECURSOR COMPOSITION FOR POROUS MEMBRANE AND PROCESS FOR PREPARATION THEREOF, POROUS MEMBRANE AND PROCESS FOR PRODUCTION THEREOF, AND SEMICONDUCTOR DEVICE |
摘要 |
<p>Disclosed is a precursor composition for a porous membrane comprising at least one compound selected from a compound represented by the formula: Si(OR<SUP>1</SUP>)<SUB>4</SUB> and a compound represented by the formula: R<SUB>a</SUB>(Si)(OR<SUP>2</SUP>)<SUB>4-a</SUB> (wherein R<SUP>1</SUP> represents a monovalent organic group; R represents a hydrogen atom, a fluorine atom or a monovalent organic group; R<SUP>2</SUP> represents a monovalent organic group; and a is an integer of 1 to 3, provided that R, R<SUP>1</SUP> and R<SUP>2</SUP> may the same as or different from one another), a thermally decomposable organic compound which is thermally decomposed at a temperature of 250°C or higher, an element having a catalytic effect and an organic solvent. A solution of the precursor composition can be subjected to the gas phase polymerization with a hydrophobic compound to produce a hydrophobic porous membrane having a low dielectric constant, a low refraction index and a high mechanical strength. Also disclosed is a semiconductor device having the porous membrane.</p> |
申请公布号 |
WO2006101027(A1) |
申请公布日期 |
2006.09.28 |
申请号 |
WO2006JP305350 |
申请日期 |
2006.03.17 |
申请人 |
ULVAC, INC.;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;MITSUI CHEMICALS, INC.;FUJII, NOBUTOSHI;NAKAYAMA, TAKAHIRO;KANAYAMA, TOSHIHIKO;KOHMURA, KAZUO;TANAKA, HIROFUMI |
发明人 |
FUJII, NOBUTOSHI;NAKAYAMA, TAKAHIRO;KANAYAMA, TOSHIHIKO;KOHMURA, KAZUO;TANAKA, HIROFUMI |
分类号 |
C09D7/12;C09D183/00;H01L21/316 |
主分类号 |
C09D7/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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