| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus wherein a shape change of a reservoir by pressure increasing in the reservoir is controlled to make it possible that lowering of weighing accuracy, unstableness of foundation state of the reservoir and damage of the reservoir are prevented. SOLUTION: The reservoir 20, which is formed with a flexible material in a shape of a sealed container and has a liquid supplying opening part 52a and a liquid discharging opening part 52b, is received in an exterior container 38, which is formed with a rigid material, is opened in one side and has an inner shape equivalent to an outer shape of the reservoir 20, an opening of the exterior container 38 is closed with a covering part material 44 in which a piping hole 54a, 54b corresponding to the liquid supplying opening part 52a and the liquid discharging opening part 52b of the reservoir 20 is formed, and the covering part material 44 is adhered to the exterior container 38 by an adhesion member 48, 50. A treatment liquid stored in the reservoir 20 is supplied through a supplying pipe to a treatment part where a substrate treatment by the treatment liquid is carried out. COPYRIGHT: (C)2006,JPO&NCIPI
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