SHAPE MEASUREMENT APPARATUS AND SHAPE MEASUREMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a shape measurement method and its apparatus allowing to easily correlate a two-dimensional or three-dimensional shape with shape indicators. SOLUTION: A curve equation is fitted to the three-dimensional shape of a semiconductor pattern measured by an arbitrary three-dimensional shape measurement method. The three-dimensional shape is corrected by adjusting the parameters of the curve equation on the basis of the shape indicators calculated separately. The relationship between the shape indicators and the parameters are stored in a database, and the measured shape is corrected on the basis of the relationship during measurement. COPYRIGHT: (C)2006,JPO&NCIPI