发明名称 Semiconductor photodetector and method for making the same
摘要 The photo detector has semiconductor zones arranged above a p-doped silicon substrate, with dopants for forming a space charge zone. A silicon-germanium glass layer (2) and a silicon layer (3) are provided between the charge zone and the substrate. The layers are provided with different refractive indices for forming distributed Bragg-reflectors for a reflection of electromagnetic radiation to be detected in a direction of the zone. An independent claim is also included for a method for fabricating a semiconductor -photo detector.
申请公布号 EP1705716(A1) 申请公布日期 2006.09.27
申请号 EP20060005588 申请日期 2006.03.18
申请人 ATMEL GERMANY GMBH 发明人 HOEHNEMANN, HOLGER, DIPL.-ING.
分类号 H01L31/0232 主分类号 H01L31/0232
代理机构 代理人
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