发明名称 |
Semiconductor photodetector and method for making the same |
摘要 |
The photo detector has semiconductor zones arranged above a p-doped silicon substrate, with dopants for forming a space charge zone. A silicon-germanium glass layer (2) and a silicon layer (3) are provided between the charge zone and the substrate. The layers are provided with different refractive indices for forming distributed Bragg-reflectors for a reflection of electromagnetic radiation to be detected in a direction of the zone. An independent claim is also included for a method for fabricating a semiconductor -photo detector. |
申请公布号 |
EP1705716(A1) |
申请公布日期 |
2006.09.27 |
申请号 |
EP20060005588 |
申请日期 |
2006.03.18 |
申请人 |
ATMEL GERMANY GMBH |
发明人 |
HOEHNEMANN, HOLGER, DIPL.-ING. |
分类号 |
H01L31/0232 |
主分类号 |
H01L31/0232 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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