Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby

摘要

In one configuration of an arrangement according to an embodiment of the invention, a first grating patch on one module is aligned with a first grating patch on another module. In a different configuration of the arrangement, a second grating patch on the one module is aligned with a second grating patch on the other module. The two configurations are not aligned at the same time.