High pressure processing apparatus and method

摘要

When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO₂ to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO₂ expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO₂ is used to wash the substrate and clean the circulation line. The flow of supercritical CO₂ is sent to the substrate washing chamber 5 . After flowing through the circulation line, including a circulation channel 11 , it passes through a bypass channel 12 to a decompressor 7 . Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.