Travelling-wave tube fabricating method, involves vacuum annealing insulating ceramic supports, of helix, covered with carbon-boron layer and thin protection alumina layer at specific temperature

摘要

The method involves preparing a mixture of fritted carbon and boron powder for the realization of a target for deposit by cathode sputtering. A carbon-boron layer (62) having a thickness ranging between 250 and 1500 Å is deposited on a surface of insulating ceramic supports of a helix, by cathode sputtering of the mixture. A thin protection alumina layer (64) is deposited on all the surface of the carbon-boron layer. The ceramic supports covered with the layers are vacuum annealed at a temperature between 1000 and 1120 degree Celsius.