| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase the resolution while securing a wide depth of focus when transferring patterns arranged in a lattice form. <P>SOLUTION: A mask pattern is prepared wherein a phase inversion type auxiliary pattern is so formed as to surround each of the patterns arranged in a lattice form. A secondary light source on the pupil surface PIL of a lighting optical system which illuminates the mask pattern consists of a tetrapolar secondary light source 21A-21D having a small σ value or a cross-shaped secondary light source 22. The polarized state of the illumination light from the secondary light source 21A-21D or 22 is so set that the illumination light may be linearly polarized in the emission direction from the optical axis AX. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
