发明名称 FIELD-EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a field-effect transistor which secures breakdown voltage BVdss, suppresses a temporal change in set current, and has small on-resistance of amplifying elements. SOLUTION: A field-effect transistor is provided with a source electrode 30 and a drain electrode 29 formed to be spaced apart from each other on a semiconductor substrate 2; and a gate electrode 22 arranged between the source electrode 30 and the drain electrode 29. In the region between the gate electrode 22 and the drain electrode 29, there are provided field plate electrodes (24 and 26) through the insulating film 21 on the upper part of the semiconductor substrate 2. The semiconductor substrate 2 has a flat surface, and is constituted in such a manner that the distance between the semiconductor substrate 2 and the field plate electrodes (24 and 26) increases according as it goes toward the drain electrode 29 from the gate electrode 22. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006253654(A) 申请公布日期 2006.09.21
申请号 JP20060000629 申请日期 2006.01.05
申请人 NEC ELECTRONICS CORP 发明人 TSUBAKI SHIGEKI
分类号 H01L29/78;H01L29/06 主分类号 H01L29/78
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