发明名称 SURFACE ACCURACY MEASURING METHOD, INTERFEROMETER, SURFACE ACCURACY MEASURING INSTRUMENT, AND PROJECTION OPTICAL SYSTEM MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a surface accuracy measuring method for highly accurately measuring even a minute undulation element without being affected by a focusing error or imaging aberration. <P>SOLUTION: According to this surface accuracy measuring method, interference fringes are detected by a detector 16 to find the amount of undulation element on a surface 22a under inspection, the interference fringes formed by a light beam LW under inspection comprising reflection light produced on the surface 22a and a reference light beam LR having a wave surface of a prescribed shape. In this measuring method, a filter F is used for limiting the light beam LW entering the detector 16 to two light beams comprising one of &plusmn;primary diffracted light beams obtained by diffracting/reflecting the light beam LW by the surface 22a owing to the undulation element on the surface 22a and a 0-th diffracted light beam obtained by regularly reflecting the light beam LW by the surface 22a. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006250858(A) 申请公布日期 2006.09.21
申请号 JP20050070785 申请日期 2005.03.14
申请人 NIKON CORP 发明人 NAKAYAMA SHIGERU
分类号 G01B11/24;G01B9/02;G03F7/20;G21K1/06;H01L21/027 主分类号 G01B11/24
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