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发明名称
Apparat und Verfahren zur Plasmabehandlung
摘要
申请公布号
DE69929271(T2)
申请公布日期
2006.09.21
申请号
DE1999629271T
申请日期
1999.10.20
申请人
MATSUSHITA ELECTRIC WORKS LTD.
发明人
SAWADA, YASUSHI;NAKAMURA, KOSUKE;KITAMURA, HIROAKI;INOUE, YOSHITAMI
分类号
H01J37/32;H05H1/24
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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