| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a color filter which is reduced in residue and is less in pattern defects, and to provide a chemically amplified positive resist composition for a color filter to be used for manufacturing the above color filter. <P>SOLUTION: The composition contains a polymer having a group expressed by formula (I), a compound which generates an acid by irradiation with radiation, an organic solvent and a colorant. In formula (I), R<SP>1</SP>, R<SP>2</SP>and R<SP>3</SP>are identical or different and each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or the like; and X represents O or NR, wherein R represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
