发明名称 Very high repetition rate narrow band gas discharge laser system
摘要 A laser system and method is disclosed which may comprise a first line narrowed gas discharge laser system producing a first laser output light pulse beam at a pulse repetition rate of >=2000 Hz; a second line narrowed gas discharge laser system producing a second laser output light pulse beam at a pulse repetition rate of >=2000 Hz; a beam combiner combining the first and second output light pulse beams into a combined laser output light pulse beam with a >=4000 Hz pulse repetition rate. The apparatus and method may comprise a compression head comprising a storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes.
申请公布号 US2006209916(A1) 申请公布日期 2006.09.21
申请号 US20060363116 申请日期 2006.02.27
申请人 HOLTAWAY EDWARD P;MOOSMAN BRYAN;RAO RAJASEKHAR M 发明人 HOLTAWAY EDWARD P.;MOOSMAN BRYAN;RAO RAJASEKHAR M.
分类号 H01S3/22;H01S3/00;H01S3/03;H01S3/038;H01S3/08;H01S3/081;H01S3/097;H01S3/104;H01S3/13;H01S3/223;H01S3/23 主分类号 H01S3/22
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