发明名称 |
Method and apparatus for manufacturing liquid drop ejecting head |
摘要 |
The method and apparatus manufacture a liquid drop ejecting head. The method and apparatus blast particles on a substrate having on an upper layer a patterned mask layer made of an organic material and on a lower layer a driver circuit for ejecting a liquid drop to thereby perform an etching process on parts of the substrate exposed from the mask layer. The etching process is performed in an ionic atmosphere ionized with a polarity opposite to a charged polarity generated in the substrate when the substrate is subjected to etching.
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申请公布号 |
US7108584(B2) |
申请公布日期 |
2006.09.19 |
申请号 |
US20020255100 |
申请日期 |
2002.09.26 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
YAMAMOTO RYOICHI |
分类号 |
B24B1/00;B24C1/04;B41J2/16 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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