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发明名称
互补金氧半-微机电系统的制程
摘要
一种与互补金氧半完全相容的微机电系统多计划晶片的制程,包括在一晶片表面上涂布一层厚光阻,图案化该光阻以定义一微加工区域,以及在该微加工区域中进行一微加工以形成悬浮微结构。
申请公布号
TW200633075
申请公布日期
2006.09.16
申请号
TW094139507
申请日期
2005.11.10
申请人
财产法人国家实验研究院国家晶片系统设计中心
发明人
萧富元;庄英宗;邱进峰
分类号
H01L21/336;H01L21/30;B81B7/02
主分类号
H01L21/336
代理机构
代理人
黄重智
主权项
地址
新竹市科学工业园区展业一路26号7楼
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