发明名称 VISUAL INSPECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a visual inspection apparatus capable of efficiently inspecting a wafer by effectively putting the standby time of another wafer to practical use during a period when the visual inspection of one of a plurality of wafers set at the same time is performed. SOLUTION: The visual inspection device 1 is equipped with a pre-inspection means 3 for performing the pre-inspection related to a sample 23 before the visual inspection of the sample is performed by a visual inspection means 2 in addition to the visual inspection means 2 for inspecting the appearance of the sample 23 from the photographed image obtained by photographing the surface of the sample 23. In this visual inspection apparatus 1, the inspection condition of visual inspection is altered on the basis of the result of the pre-inspection performed with respect to the sample 23 while the inspection apparatus 3 is constituted so as to perform the pre-inspection of the sample 23 in parallel to the visual inspection of another sample 23 other than the inspected sample 23 by the visual inspection means 2. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006242681(A) 申请公布日期 2006.09.14
申请号 JP20050057083 申请日期 2005.03.02
申请人 TOKYO SEIMITSU CO LTD 发明人 ISHIKAWA AKIO
分类号 G01N21/956;H01L21/66 主分类号 G01N21/956
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