| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition not only excellent in performances such as sensitivity, insulating property and chemical resistance but in particular, significantly improved in transmittance and storage stability, and suitable for forming an interlayer insulating film in the process of manufacturing a LCD. <P>SOLUTION: The photosensitive resin composition comprises, in particular: (a) an acrylic copolymer obtained by copolymerizing (i) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride or a mixture of these, (ii) one or more kinds of epoxy group-containing unsaturated compounds selected from a group consisting of formula (1) to (8), and (iii) an olefin-based unsaturated compound, and then removing monomers not involved in the reaction; (b) a 1,2-quinonediazide compound; and (c) a solvent. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
