| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device preventing accumulation of bubbles, in view of a point that in an immersion lithography device that fills up a space between a final lens element and a substrate of a projection system of a lithography device, although the number of openings is increased by using a concave lens in this final element, the bubbles are confined under the final element, thereby disturbing a projected image. <P>SOLUTION: The concave refractive lens 30 is used as a final element of a projection system PL while keeping away from an optical axis OA. Therefore a maximum point of the lower surface of this lens does not exist in an image field EF, thus eliminating a case that bubbles in an immersion liquid 11 remains in the image field EF. Also, unused portion of a lens 30 is cut off, and the immersion liquid 11 can be fed from an upper part of the lens 30, and a smooth flow is obtained, thus making it possible to cool a hottest part close to a projection beam PB of the lens 30. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
