| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for film formation, particularly a composition for film formation capable of forming an insulating film, used for electronic devices or the like, having a low dielectric constant and a relative dielectric constant hardly suffering from changes with time, an insulating film, and an electronic device comprising the same. SOLUTION: The composition for film formation comprises a polymer, obtained by polymerizing a compound having an ethylenic double bond and a cage structure in the presence of a solvent and a polymerization catalyst, and a coating solvent. The insulating film and the electronic device are obtained using the same. COPYRIGHT: (C)2006,JPO&NCIPI
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