发明名称 Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source
摘要 Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.
申请公布号 US7106832(B2) 申请公布日期 2006.09.12
申请号 US20050031535 申请日期 2005.01.10
申请人 ASML NETHERLANDS B.V. 发明人 KLUNDER DERK JAN WILFRED;BAKKER LEVINUS PIETER;BANINE VADIM YEVGENYEVICH;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS
分类号 G21K3/00 主分类号 G21K3/00
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