发明名称 |
Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source |
摘要 |
Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.
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申请公布号 |
US7106832(B2) |
申请公布日期 |
2006.09.12 |
申请号 |
US20050031535 |
申请日期 |
2005.01.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KLUNDER DERK JAN WILFRED;BAKKER LEVINUS PIETER;BANINE VADIM YEVGENYEVICH;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS |
分类号 |
G21K3/00 |
主分类号 |
G21K3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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