| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the contrast on forming a resist pattern. <P>SOLUTION: The positive resist composition contains a resin component (A) having an acid dissociable dissolution inhibiting group and having the alkali solubility increased by the effect of an acid, an acid generating agent component (B) which generates an acid by exposure, and a compound (C) expressed by general formula (1). In formula (1), R<SP>1</SP>represents a 1-5C straight-chain or branched alkylene group; R<SP>2</SP>represents an acid dissociable dissolution inhibiting group; R<SP>3</SP>represents a hydrogen atom or a 1-4C straight-chain or branched alkyl group; and n represents an integer 1 to 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
