发明名称 |
SINGLE MASK PROCESS FOR VARIABLE THICKNESS DUAL DAMASCENE STRUCTURES, OTHER GREY-MASKING PROCESSES, AND STRUCTURES MADE USING GREY-MASKING |
摘要 |
By using a multiple grey tone mask with at least two greys in semiconductor manufacture, multiple wiring thicknesses can now be made in a single level where previously only one wiring thickness could be provided. For example, power and signal wires of different thicknesses in a single layer can be provided.
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申请公布号 |
US2006197228(A1) |
申请公布日期 |
2006.09.07 |
申请号 |
US20050906752 |
申请日期 |
2005.03.04 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DAUBENSPECK TIMOTHY H.;GAMBINO JEFFREY P.;OSTROWSKI KEVIN A.;SAUTER WOLFGANG |
分类号 |
H01L23/48 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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