发明名称 SINGLE MASK PROCESS FOR VARIABLE THICKNESS DUAL DAMASCENE STRUCTURES, OTHER GREY-MASKING PROCESSES, AND STRUCTURES MADE USING GREY-MASKING
摘要 By using a multiple grey tone mask with at least two greys in semiconductor manufacture, multiple wiring thicknesses can now be made in a single level where previously only one wiring thickness could be provided. For example, power and signal wires of different thicknesses in a single layer can be provided.
申请公布号 US2006197228(A1) 申请公布日期 2006.09.07
申请号 US20050906752 申请日期 2005.03.04
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DAUBENSPECK TIMOTHY H.;GAMBINO JEFFREY P.;OSTROWSKI KEVIN A.;SAUTER WOLFGANG
分类号 H01L23/48 主分类号 H01L23/48
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